Month: August 2022

Spherical Indexing

Will Lenthe, Principal Software Engineer, EDAX

Dictionary indexing compares experimental electron backscatter diffraction (EBSD) patterns against a dictionary of simulated patterns for each orientation on a uniform grid in orientation space [1,2]. Synthetic patterns are generated by rotating the Kikuchi sphere by the crystal orientation and projecting onto a plane using the experimental geometry. Comparison against a physics-based forward model gives excellent precision and noise tolerance at the cost of significant computational overhead. Spherical harmonic-based indexing uses the same Kikuchi sphere or ‘master pattern,’ but back projects experimental patterns onto the sphere instead. The orientation is indexed using the maximum spherical cross-correlation between the back-projected pattern and the Kikuchi sphere [3,4]. Mathematically, dictionary and spherical indexing are extremely similar, but the spherical approach is more numerically efficient since it can leverage fast Fourier transforms for the computations. In practice, spherical indexing provides similar precision [5] and noise tolerance to dictionary indexing but at much faster speeds.

A GPU implementation of spherical harmonic-based EBSD indexing implemented in OIM Analysis™ as part of the OIM Matrix module provides excellent indexing quality at hundreds or thousands of patterns per second. Here, we applied it to a range of scans to demonstrate the indexing quality and user parameters.

Spherical harmonic indexing has two parameters: bandwidth and grid size. Bandwidth is how far in frequency space to compute harmonics (analogous to a low pass filter on the EBSD pattern). Grid size is the correlation resolution with an Euler angle cube of (grid size)3 used for correlation (i.e., 0 – 360 for phi1, Phi, and phi2). In general, computation time scales with the number of Euler angle grid points, and a reasonable bandwidth is one less than half the grid size. For example, the following are some reasonable pairs of values:

BandwidthGrid Size
63128
95192
127256

Once the best Euler grid point (maximum cross-correlation) is selected, subpixel resolution can be achieved through a refinement step.

Ni Sequence

This dataset is a scan of the same region at different camera gains to intentionally produce corresponding sets of low and high-quality patterns.

Figure 1. Shows a) the result of indexing high-quality patterns, b) spherical harmonic indexing at a bandwidth of 63 and Euler grid of 1283 without refinement, and c) at a bandwidth of 63 with refinement.

Figure 1. Shows a) the result of indexing high-quality patterns, b) spherical harmonic indexing at a bandwidth of 63 and Euler grid of 1283 without refinement, and c) at a bandwidth of 63 with refinement.

Figure 1 shows a) the result of indexing high-quality patterns, b) spherical harmonic indexing at a bandwidth of 63 and Euler grid of 1283 without refinement, and c) at a bandwidth of 63 with refinement. Note that since grid point spacing is ~2.8° (360° / 128), the unrefined result has a stepped appearance due to the discrete orientation possibilities. After refinement, any orientation is possible, providing smooth results.

Figure 2. KAM maps are shown for the same region at a) 0°, b) 1°, and c) 2°.

In Figure 2, KAM maps are shown for the same region at a) 0°, b) 1°, and c) 2°. Notice that without refinement, there is no misorientation within a patch and a sharp spike between them. Even though both the Hough and refined spherical appear smooth, the slight orientation noise in the Hough indexing is visible using KAM.

Figure 3. With low-quality patterns, Hough indexing a) starts to fail, but b) spherical indexing still provides robust solutions and c) accurately captures continuous orientation gradients after refinement.

With low-quality patterns, Hough indexing a) starts to fail, but b) spherical indexing still provides robust solutions and c) accurately captures continuous orientation gradients after refinement (Figure 3).

Figure 4. a) bandwidths of 63, b) 95, and c) 127 are compared before (a – c) and after (d – f) refinement.

For very low-quality patterns, higher bandwidths may be required for better indexing results. In Figure 4, a) bandwidths of 63, b) 95, and c) 127 are compared before (a – c) and after (d – f) refinement. Note that the discrete steps in orientations before refinement become smaller with increased Euler angle grid resolution, but they refine to similar orientations. For all three bandwidths, the grid size is 2 * (bandwidth + 1).

Figure 5. 4. a) Raw pattern and b) NPAR pattern using Hough indexing and c) raw pattern and d) NPAR pattern using spherical indexing with a bandwidth of 127.

With spherical indexing integrated into OIM Analysis, existing image processing algorithms can be used for especially difficult patterns. At extremely high noise levels, Hough indexing cannot index any points, and the spherical indexing begins to fail for some points. NPAR trades spatial resolution for pattern quality by averaging each pattern with its neighbors. The improved patterns can be indexed reliably by both methods but Hough indexing struggles with the resulting overlap patterns near grain boundaries (Figure 5).

Hot Rolled Mg

Figure 6. Hough indexing struggles to index when pattern quality is reduced by a) high deformation, but b) spherical indexing is robust against significantly degraded pattern quality. Note that the d) spherical indexing confidence index strongly correlates with c) image quality but is high even in some regions with extremely low IQ.

Hough indexing struggles to index when pattern quality is reduced by a) high deformation, but b) spherical indexing is robust against significantly degraded pattern quality. Note that the d) spherical indexing confidence index strongly correlates with c) image quality but is high even in some regions with extremely low IQ (Figure 6).

Rutile

Figure 7. Excellent results are possible even with a single pattern center used for the entire dataset. Vignetting is visible in a) an IPF+IQ map of Hough indexing with a fixed pattern center. The field is flat over the entire area for b) an IPF+CI map of spherical indexing with a fixed pattern center.

Spherical indexing can use a unique pattern center for each point at no extra cost for large fields of view. Excellent results are possible even with a single pattern center used for the entire dataset, as shown in Figure 7. 

Deformed Duplex Steel

Figure 8. Phase discrimination depends on the similarity of the phases with a two-phase steel. In addition to the quality in orientation results with d – f) spherical indexing vs. a – c) Hough indexing, b – c & e – f) phase discrimination is improved with spherical BCC and FCC iron well separable.

Spherical indexing can be applied to multiple phases in the same way as any other indexing technique. Phase discrimination depends on the similarity of the phases with a two-phase steel shown in Figure 8. In addition to the quality in orientation results with d – f) spherical indexing vs. a – c) Hough indexing, b – c & e – f) phase discrimination is improved with spherical BCC and FCC iron well separable. Real space refinement may be required for particularly difficult cases in addition to the spherical harmonic refinement shown.

Figure 9. a) spherical CI + IPF shows similar trends as b) Hough IQ + IPF.

Again, spherical indexing’s confidence index correlates well with pattern quality. In Figure 9, a) spherical CI + IPF shows similar trends as b) Hough IQ + IPF.

References

  1. Callahan, P. G., & De Graef, M. (2013). Dynamical electron backscatter diffraction patterns. Part I: Pattern simulations. Microscopy and Microanalysis, 19(5), 1255-1265.
  2. Callahan, P. G., & De Graef, M. (2013). Dynamical electron backscatter diffraction patterns. Part I: Pattern simulations. Microscopy and Microanalysis, 19(5), 1255-1265.
  3. Lenthe, W. C., Singh, S., & De Graef, M. (2019). A spherical harmonic transform approach to the indexing of electron backscattered diffraction patterns. Ultramicroscopy, 207, 112841.
  4. Hielscher, R., Bartel, F., & Britton, T. B. (2019). Gazing at crystal balls: Electron backscatter diffraction pattern analysis and cross-correlation on the sphere. Ultramicroscopy, 207, 112836.
  5. Sparks, G., Shade, P. A., Uchic, M. D., Niezgoda, S. R., Mills, M. J., & Obstalecki, M. (2021). High-precision orientation mapping from spherical harmonic transform indexing of electron backscatter diffraction patterns. Ultramicroscopy, 222, 113187.

模拟他们！

Dr. Chang Lu, Application Scientist, Gatan & EDAX

2022年初，Gatan和EDAX这两家公司完成了整合，我们的部门更名为Electron Microscope Technology (EMT)。作为EMT中国团队的应用技术支持，我负责中国北方区扫描电镜（SEM）还有透射电镜（TEM）上Gatan还有EDAX的几乎全部产品。产品多样，服务的用户群体也多样。慢慢地在工作过程中，我就发现两边的数据分析软件（Gatan的Digital Micrograph以及EDAX的Orientation Imaging Microscopy）其实并不是完全分开的，很多时候它们可以在不同程度上相互支持，互通互联。

比如说，Gatan公司在TEM平台上知名的DigitalMicrograph（DM）软件。DM可以处理一系列的电镜相关的表征数据。对于部分信号较弱的EDAX能谱结果，我们也可以把数据载入，通过DM内置的图像平滑，互相关算法以及主成分分析（PCA）进行数据的优化处理。但是我今天更想要分享的是EDAX Orientation Imaging Microscopy（OIM）软件在TEM平台上的一些应用。

在我服务的客户群体中，有一些用户尤其关注一些纳米级的物相和晶粒。这时候在TEM平台，我们往往需要使用到电子衍射的手段来对样品进行判断。然而，很多时候单单依靠透射电镜下灰度值衬度的变化，一些微弱的物相的改变很难被发觉。同时，一张干净，漂亮的来自特定晶向的电子衍射，往往需要我们对样品旋转晶带轴。虽然我们可以沿着特定的菊池线去找菊池极，但是这条菊池线对应什么晶面？菊池极对应哪个晶带轴？我们往往需要在Difpack工具里面标定晶格间距和角度，再比对样品材料不同晶面和夹角才有可能清楚，这很麻烦。

我第一次注意到OIM中的Pattern Simulation功能是因为帮助某个研究应力应变的老师输出无应力的特定取向的标准菊池花样图。然后我注意到，其实我是可以对应更改电镜的加速电压，样品倾斜角度还有取向来得到一系列的菊池花样，比如下图这个200 kV加速电压下得到的NdCeB 样品的模拟花样。我们可以对左下角的orientation参数进行修改，得到一系列模拟出来的菊池花样。通过Kinematic Color Overlay，我们还可以知道对应的菊池线对应的是什么晶面。现在，当我们处于未知状态开始转晶带轴的时候我都会首先模拟几个相似的取向，进行对比。这样一来，我沿着那个晶面（菊池线）在找哪个晶带轴（菊池极）都变得异常清楚，这非常方便。

图 1. NdCeB 使用 OIM Matrix。

现在，当Gatan的用户再拿来一个“奇奇怪怪”的样品说要找到特定晶带轴做衍射，我也不像以前担心怎么搞了。需要什么，我们就在EDAX OIM中先模拟出来一个，对着这个模拟的图，旋转，调整晶面，然后在TEM电子衍射过程中去找。我想从解决问题的角度来讲，Gatan和EDAX丰富的软件资源，就像我们这两家公司的合并一样，未来也可以合并解决客户复杂和困难的问题。

Simulate them!

Dr. Chang Lu, Application Specialist, Gatan & EDAX

In early 2022, Gatan and EDAX completed the integration, and our new division was named Electron Microscope Technology (EMT). As an EMT application scientist on the China applications team, I am responsible for almost all the Gatan and EDAX products for Northern China, on both Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) platforms. Therefore, I work with diversified products and diversified user groups that focus on different subject matters. In the first half of this year, I found that the data analysis software from EMT Gatan’s DigitalMicrograph® (DM) and EDAX’s OIM Analysis™ are not completely isolated, but in many cases, they can cooperate with each other to help our customers.

For instance, DM can do a series of electron microscopy-related data processing. For some energy dispersive spectroscopy (EDS) mapping data from the minor content, there are various methods to achieve smoothing and enhance the contrast. While in the MSA panel, the principal component analysis (PCA) function can be helpful in terms of high-resolution EDS mapping. However, in today’s EDAX blog, I will talk a little bit more about one feature in OIM Analysis that could potentially benefit a lot of Gatan camera users.

In northern China, there are a group of Gatan users who are focused on nanoscale phases and grains in the TEM. In most scenarios, they heavily employ electron diffraction or bright field imaging to make judgments. However, it is really difficult to determine the unknown (unidentified but has a known x-ray diffraction (XRD) pattern and chemical composition, so there is a potential for it) phase by simply relying on the minor changes of grayscale bright field images. You may say diffraction could help. Yes, a clean, beautiful diffractogram of a particular crystal direction can be helpful. But, no, you need to find the zone axis carefully. If this unknown phase has a crystal structure of low symmetry, most of the time, the effort will be in vain. Generally speaking, the Difpack tool in the DM software could help in determining d-spacing and angles, however, it is not intuitive enough to know the sample at first sight.

The solution is pattern simulation with OIM Matrix™. At first, I noticed this feature because it helped an EDAX user who was studying strains. It can easily export a theoretical Kikuchi pattern for a specific sample orientation with zero stress. Then one day, I had a sudden thought during my morning shower. Maybe I can change the acceleration voltage to 200 kV (typical for TEM), and the sample tilt angle to 0° (make it flat). After entering a specific orientation, we can get a Kikuchi pattern under TEM conditions! For example, take the simulated pattern from NdCeB. With Kinematic Color Overlay, we can also find out what crystal plane corresponds to a specific Kikuchi line. Now, when we start changing the zone axis in an unidentified sample, we can first simulate several orientations and compare them with what we see under TEM. In this way, the process of finding the Kikuchi pole turns out to be very convenient.

Figure 1. A simulated pattern from NdCeB using OIM Matrix.

Now, when some Gatan users bring in some “weird” unidentified samples and say they want to find various zone axis for doing diffractions. I don’t worry about it. I think from a problem-solving point of view, the powerful software from both Gatan and EDAX, like the integration of two companies, can also be combined to solve complex and difficult problems for our customers in the future.